Ionized-cluster beam deposition and epitaxy / by Toshinori Takagi.
Ionized-cluster beam deposition and epitaxy / by Toshinori Takagi.
About this item
Full title
Author / Creator
Publisher
Park Ridge, N.J., U.S.A. : Noyes Publications, c1988.
Call Numbers
N621.3817/30
Record Identifier
MMS ID
Language
English
Formats
Physical Description
Physical content
viii, 231 p. : ill. ; 26 cm.
Publication information
Publisher
Park Ridge, N.J., U.S.A. : Noyes Publications, c1988.
Place of Publication
New Jersey
Date Published
c1988.
Subjects
More information
Scope and Contents
Summary
The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited are often superior to those deposited by either e...
Alternative Titles
Full title
Ionized-cluster beam deposition and epitaxy / by Toshinori Takagi.
Notes
General note
Includes index.
Bibliography: p. 218-228.
Additional physical form availability note
Also available online via the World Wide Web, by subscription to Knovel.
Identifiers
Primary Identifiers
Call Numbers
N621.3817/30
Record Identifier
74VvoBMDbbEb
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/74VvoBMDbbEb
Other Identifiers
ISBN
081551168X
081551168X :
9781591241072 (electronic bk.)
1591241073 (electronic bk.)
DDC
621.3817
621.38152
MMS ID
991013382909702626
