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Low-temperature deposition of TiO 2 by atmospheric pressure PECVD towards photoanode elaboration for...

Low-temperature deposition of TiO 2 by atmospheric pressure PECVD towards photoanode elaboration for...

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_crossref_primary_10_1051_epjpv_2019006

Low-temperature deposition of TiO 2 by atmospheric pressure PECVD towards photoanode elaboration for perovskite and solid-state dye-sensitized solar cells

About this item

Full title

Low-temperature deposition of TiO 2 by atmospheric pressure PECVD towards photoanode elaboration for perovskite and solid-state dye-sensitized solar cells

Journal title

EPJ Photovoltaics, 2019, Vol.10, p.5

Language

English

Formats

More information

Scope and Contents

Contents

An original low-temperature atmospheric pressure plasma-enhanced chemical vapor deposition process was used to deposit titanium dioxide thin films. The parametric study in dynamic mode deposition aimed at growing an ideal columnar film composed of aligned anatase monocrystals as solar cell photoanode, previously obtained on silicon wafers in static...

Alternative Titles

Full title

Low-temperature deposition of TiO 2 by atmospheric pressure PECVD towards photoanode elaboration for perovskite and solid-state dye-sensitized solar cells

Identifiers

Primary Identifiers

Record Identifier

TN_cdi_crossref_primary_10_1051_epjpv_2019006

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_crossref_primary_10_1051_epjpv_2019006

Other Identifiers

ISSN

2105-0716

E-ISSN

2105-0716

DOI

10.1051/epjpv/2019006

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