Low-temperature deposition of TiO 2 by atmospheric pressure PECVD towards photoanode elaboration for...
Low-temperature deposition of TiO 2 by atmospheric pressure PECVD towards photoanode elaboration for perovskite and solid-state dye-sensitized solar cells
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English
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An original low-temperature atmospheric pressure plasma-enhanced chemical vapor deposition process was used to deposit titanium dioxide thin films. The parametric study in dynamic mode deposition aimed at growing an ideal columnar film composed of aligned anatase monocrystals as solar cell photoanode, previously obtained on silicon wafers in static...
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Low-temperature deposition of TiO 2 by atmospheric pressure PECVD towards photoanode elaboration for perovskite and solid-state dye-sensitized solar cells
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TN_cdi_crossref_primary_10_1051_epjpv_2019006
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https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_crossref_primary_10_1051_epjpv_2019006
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2105-0716
E-ISSN
2105-0716
DOI
10.1051/epjpv/2019006