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Ultrafast Patterning Vertically Aligned Carbon Nanotube Forest on Al Foil and Si Substrate Using Che...

Ultrafast Patterning Vertically Aligned Carbon Nanotube Forest on Al Foil and Si Substrate Using Che...

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_0b898bc0e86241b9a1fabfd8f3d034d2

Ultrafast Patterning Vertically Aligned Carbon Nanotube Forest on Al Foil and Si Substrate Using Chemical Vapor Deposition (CVD)

About this item

Full title

Ultrafast Patterning Vertically Aligned Carbon Nanotube Forest on Al Foil and Si Substrate Using Chemical Vapor Deposition (CVD)

Publisher

Basel: MDPI AG

Journal title

Nanomaterials (Basel, Switzerland), 2019-09, Vol.9 (9), p.1332

Language

English

Formats

Publication information

Publisher

Basel: MDPI AG

More information

Scope and Contents

Contents

This study introduces a method of patterning carbon nanotube (CNTs) forests that is both fast and simple. We found that, as commercially available oil-based markers undergo nanotube synthesis, a thin film forms that prevents the catalyst, ferrocene, from coming into contact with the surface of the test sample. This, thus, blocks CNT growth. Through...

Alternative Titles

Full title

Ultrafast Patterning Vertically Aligned Carbon Nanotube Forest on Al Foil and Si Substrate Using Chemical Vapor Deposition (CVD)

Authors, Artists and Contributors

Identifiers

Primary Identifiers

Record Identifier

TN_cdi_doaj_primary_oai_doaj_org_article_0b898bc0e86241b9a1fabfd8f3d034d2

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_0b898bc0e86241b9a1fabfd8f3d034d2

Other Identifiers

ISSN

2079-4991

E-ISSN

2079-4991

DOI

10.3390/nano9091332

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