Fabrication and electrical characterization of low-temperature polysilicon films for sensor applicat...
Fabrication and electrical characterization of low-temperature polysilicon films for sensor applications
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Switzerland: Multidisciplinary Digital Publishing Institute (MDPI)
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Language
English
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Switzerland: Multidisciplinary Digital Publishing Institute (MDPI)
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This work was carried out in part through the use of the INL Micro and Nanofabrication Facility.
The development of low-temperature piezoresistive materials provides compatibility with standard silicon-based MEMS fabrication processes. Additionally, it enables the use of such material in flexible substrates, thereby expanding the potential for v...
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Full title
Fabrication and electrical characterization of low-temperature polysilicon films for sensor applications
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TN_cdi_doaj_primary_oai_doaj_org_article_33ba9839fd7e47c0bd3c41ff2660b7f9
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_33ba9839fd7e47c0bd3c41ff2660b7f9
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ISSN
2072-666X
E-ISSN
2072-666X
DOI
10.3390/mi16010057
