Plasma-Assisted Atomic Layer Deposition of IrO2 for Neuroelectronics
Plasma-Assisted Atomic Layer Deposition of IrO2 for Neuroelectronics
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Publisher
Basel: MDPI AG
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Language
English
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Publisher
Basel: MDPI AG
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Contents
In vitro and in vivo stimulation and recording of neuron action potential is currently achieved with microelectrode arrays, either in planar or 3D geometries, adopting different materials and strategies. IrO2 is a conductive oxide known for its excellent biocompatibility, good adhesion on different substrates, and charge injection capabilities high...
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Full title
Plasma-Assisted Atomic Layer Deposition of IrO2 for Neuroelectronics
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TN_cdi_doaj_primary_oai_doaj_org_article_349ad47041044011bd75ad7932444b91
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_349ad47041044011bd75ad7932444b91
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ISSN
2079-4991
E-ISSN
2079-4991
DOI
10.3390/nano13060976
