Auger Electron Spectroscopy (AES) and X-ray Photoelectron Spectroscopy (XPS) Profiling of Self Assem...
Auger Electron Spectroscopy (AES) and X-ray Photoelectron Spectroscopy (XPS) Profiling of Self Assembled Monolayer (SAM) Patterns Based on Vapor Deposition Technique
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Author / Creator
Li, Shi , Zhang, Hongru , Liu, Zheng , Xu, Junquan , Fan, Guofang , Li, Wei , Li, Qi , Hu, Xiaodong and Jing, Gaoshan
Publisher
Basel: MDPI AG
Journal title
Language
English
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Publisher
Basel: MDPI AG
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Contents
It is crucial to develop novel metrology techniques in the semiconductor fabrication process to accurately measure a film’s thickness in a few nanometers, as well as the material profile of the film. Highly uniform trichlorosilane (1H,1H,2H,2H-perfluorodecyltrichlorosilane, FDTS) derived SAM film patterns were fabricated by several conventional sem...
Alternative Titles
Full title
Auger Electron Spectroscopy (AES) and X-ray Photoelectron Spectroscopy (XPS) Profiling of Self Assembled Monolayer (SAM) Patterns Based on Vapor Deposition Technique
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Author / Creator
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Record Identifier
TN_cdi_doaj_primary_oai_doaj_org_article_5b50c25a138241b1a707114539a7bf53
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_5b50c25a138241b1a707114539a7bf53
Other Identifiers
ISSN
2076-3417
E-ISSN
2076-3417
DOI
10.3390/app12031245
