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Ion Beam Assisted E-Beam Deposited TiN Microelectrodes—Applied to Neuronal Cell Culture Medium Evalu...

Ion Beam Assisted E-Beam Deposited TiN Microelectrodes—Applied to Neuronal Cell Culture Medium Evalu...

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_609eff46a2394184987463fd4116cd83

Ion Beam Assisted E-Beam Deposited TiN Microelectrodes—Applied to Neuronal Cell Culture Medium Evaluation

About this item

Full title

Ion Beam Assisted E-Beam Deposited TiN Microelectrodes—Applied to Neuronal Cell Culture Medium Evaluation

Publisher

Switzerland: Frontiers Research Foundation

Journal title

Frontiers in neuroscience, 2018-12, Vol.12, p.882-882

Language

English

Formats

Publication information

Publisher

Switzerland: Frontiers Research Foundation

More information

Scope and Contents

Contents

Microelectrode material and cell culture medium have significant roles in the signal-to-noise ratio and cell well-being in
electrophysiological studies. Here, we report an ion beam assisted e-beam deposition (IBAD) based process as an alternative titanium nitride (TiN) deposition method for sputtering in the fabrication of state-of-the-art TiN m...

Alternative Titles

Full title

Ion Beam Assisted E-Beam Deposited TiN Microelectrodes—Applied to Neuronal Cell Culture Medium Evaluation

Identifiers

Primary Identifiers

Record Identifier

TN_cdi_doaj_primary_oai_doaj_org_article_609eff46a2394184987463fd4116cd83

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_609eff46a2394184987463fd4116cd83

Other Identifiers

ISSN

1662-453X,1662-4548

E-ISSN

1662-453X

DOI

10.3389/fnins.2018.00882

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