Data-Driven Analysis of High-Temperature Fluorocarbon Plasma for Semiconductor Processing
Data-Driven Analysis of High-Temperature Fluorocarbon Plasma for Semiconductor Processing
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Publisher
Switzerland: MDPI AG
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Language
English
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Publisher
Switzerland: MDPI AG
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The semiconductor industry increasingly relies on high aspect ratio etching facilitated by Amorphous Carbon Layer (ACL) masks for advanced 3D-NAND and DRAM technologies. However, carbon contamination in ACL deposition chambers necessitates effective fluorine-based plasma cleaning. This study employs a high-temperature inductively coupled plasma (IC...
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Data-Driven Analysis of High-Temperature Fluorocarbon Plasma for Semiconductor Processing
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TN_cdi_doaj_primary_oai_doaj_org_article_64f028e94b494caea3872b18f2b59911
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_64f028e94b494caea3872b18f2b59911
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ISSN
1424-8220
E-ISSN
1424-8220
DOI
10.3390/s24227307
