Tailoring of Multisource Deposition Conditions towards Required Chemical Composition of Thin Films
Tailoring of Multisource Deposition Conditions towards Required Chemical Composition of Thin Films
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Publisher
Switzerland: MDPI AG
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Language
English
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Publisher
Switzerland: MDPI AG
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Contents
The model to tailor the required chemical composition of thin films fabricated via multisource deposition, exploiting basic physicochemical constants of source materials, is developed. The model is experimentally verified for the two-source depositions of chalcogenide thin films from Ga–Sb–Te system (tie-lines GaSb–GaTe and GaSb–Te). The thin films...
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Full title
Tailoring of Multisource Deposition Conditions towards Required Chemical Composition of Thin Films
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TN_cdi_doaj_primary_oai_doaj_org_article_6f13ff985cc4462791dc7967e517d653
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_6f13ff985cc4462791dc7967e517d653
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ISSN
2079-4991
E-ISSN
2079-4991
DOI
10.3390/nano12111830
