Parallel Nanoimprint Forming of One-Dimensional Chiral Semiconductor for Strain-Engineered Optical P...
Parallel Nanoimprint Forming of One-Dimensional Chiral Semiconductor for Strain-Engineered Optical Properties
About this item
Full title
Author / Creator
Wang, Yixiu , Jin, Shengyu , Wang, Qingxiao , Wu, Min , Yao, Shukai , Liao, Peilin , Kim, Moon J. , Cheng, Gary J. and Wu, Wenzhuo
Publisher
Singapore: Springer Singapore
Journal title
Language
English
Formats
Publication information
Publisher
Singapore: Springer Singapore
Subjects
More information
Scope and Contents
Contents
Highlights
Exquisite strain engineering in 1D chiral semiconductor.
Facile nanoimprinting induced tensile strain in Te nanowire.
Intriguing and tunable optical properties of 1D Te nanowire by strain engineering.
The low-dimensional, highly anisotropic geometries, and superior mechanical properties of one-dimensional (1D) nanomaterials a...
Alternative Titles
Full title
Parallel Nanoimprint Forming of One-Dimensional Chiral Semiconductor for Strain-Engineered Optical Properties
Authors, Artists and Contributors
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Primary Identifiers
Record Identifier
TN_cdi_doaj_primary_oai_doaj_org_article_9e49639b931145b5af76fe731942150e
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_9e49639b931145b5af76fe731942150e
Other Identifiers
ISSN
2311-6706
E-ISSN
2150-5551
DOI
10.1007/s40820-020-00493-3
