Enabling High‐Temperature Atomic‐Scale Investigations with Combinatorial Processing Platforms Using...
Enabling High‐Temperature Atomic‐Scale Investigations with Combinatorial Processing Platforms Using Improved Thermal SiO2 Diffusion and Reaction Barriers
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Weinheim: John Wiley & Sons, Inc
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Language
English
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Publisher
Weinheim: John Wiley & Sons, Inc
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Contents
Interactions at high temperatures between thin films and the Si substrate limit materials discovery using combinatorial processing platforms (CPPs). To overcome this, a diffusion and reaction barrier, SiO2, by thermal oxidation of Si tips is developed. The application of this diffusion barrier in CPPs for atomic‐scale investigations of new material...
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Full title
Enabling High‐Temperature Atomic‐Scale Investigations with Combinatorial Processing Platforms Using Improved Thermal SiO2 Diffusion and Reaction Barriers
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TN_cdi_doaj_primary_oai_doaj_org_article_9eeffedb6c7344a294d2d0f3968df5d4
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_9eeffedb6c7344a294d2d0f3968df5d4
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ISSN
2196-7350
E-ISSN
2196-7350
DOI
10.1002/admi.202400138
