Nucleation Behavior of SnS2 on Thiol Functionalized SAMs During Solution‐Based Atomic Layer Depositi...
Nucleation Behavior of SnS2 on Thiol Functionalized SAMs During Solution‐Based Atomic Layer Deposition
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Weinheim: John Wiley & Sons, Inc
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Language
English
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Weinheim: John Wiley & Sons, Inc
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Solution‐based atomic layer deposition (sALD) is an emerging technique that transfers the principle of traditional atomic layer deposition (ALD) from the gas phase into a wet chemical environment. This new preparation technique has new and unique properties and requirements. A large number of new surfaces and reactants are available to produce acti...
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Nucleation Behavior of SnS2 on Thiol Functionalized SAMs During Solution‐Based Atomic Layer Deposition
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TN_cdi_doaj_primary_oai_doaj_org_article_b853eab5afc64095bad7f7008072b2a7
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https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_b853eab5afc64095bad7f7008072b2a7
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ISSN
2196-7350
E-ISSN
2196-7350
DOI
10.1002/admi.202300990
