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High-performance ferroelectric field-effect transistors with ultra-thin indium tin oxide channels fo...

High-performance ferroelectric field-effect transistors with ultra-thin indium tin oxide channels fo...

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_d2a00105e28d4eb0878efc0ea00eb151

High-performance ferroelectric field-effect transistors with ultra-thin indium tin oxide channels for flexible and transparent electronics

About this item

Full title

High-performance ferroelectric field-effect transistors with ultra-thin indium tin oxide channels for flexible and transparent electronics

Publisher

London: Nature Publishing Group UK

Journal title

Nature communications, 2024-03, Vol.15 (1), p.2686-9, Article 2686

Language

English

Formats

Publication information

Publisher

London: Nature Publishing Group UK

More information

Scope and Contents

Contents

With the development of wearable devices and hafnium-based ferroelectrics (FE), there is an increasing demand for high-performance flexible ferroelectric memories. However, developing ferroelectric memories that simultaneously exhibit good flexibility and significant performance has proven challenging. Here, we developed a high-performance flexible...

Alternative Titles

Full title

High-performance ferroelectric field-effect transistors with ultra-thin indium tin oxide channels for flexible and transparent electronics

Identifiers

Primary Identifiers

Record Identifier

TN_cdi_doaj_primary_oai_doaj_org_article_d2a00105e28d4eb0878efc0ea00eb151

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_d2a00105e28d4eb0878efc0ea00eb151

Other Identifiers

ISSN

2041-1723

E-ISSN

2041-1723

DOI

10.1038/s41467-024-46878-5

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