Nonlinear Modeling of Contact Stress Distribution in Thin Plate Substrates Subjected to Aspect Ratio
Nonlinear Modeling of Contact Stress Distribution in Thin Plate Substrates Subjected to Aspect Ratio
About this item
Full title
Author / Creator
Lv, Chao , Wei, Huixin , Lan, Zhiwen and Wu, Ping
Publisher
Switzerland: MDPI AG
Journal title
Language
English
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Publication information
Publisher
Switzerland: MDPI AG
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More information
Scope and Contents
Contents
The foundation substrate's basal contact stresses are typically thought to have a linear distribution, although the actual form is nonlinear. Basal contact stress in thin plates is experimentally measured using a thin film pressure distribution system. This study examines the nonlinear distribution law of basal contact stresses in thin plates with...
Alternative Titles
Full title
Nonlinear Modeling of Contact Stress Distribution in Thin Plate Substrates Subjected to Aspect Ratio
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Author / Creator
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Record Identifier
TN_cdi_doaj_primary_oai_doaj_org_article_e3b1449a94aa47aaa15e785957b4c92a
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_e3b1449a94aa47aaa15e785957b4c92a
Other Identifiers
ISSN
1424-8220
E-ISSN
1424-8220
DOI
10.3390/s23084050
