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Optimisation of processing conditions during CVD growth of 2D WS.sub.2 films from a chloride precurs...

Optimisation of processing conditions during CVD growth of 2D WS.sub.2 films from a chloride precurs...

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_gale_infotracacademiconefile_A689534909

Optimisation of processing conditions during CVD growth of 2D WS.sub.2 films from a chloride precursor

About this item

Full title

Optimisation of processing conditions during CVD growth of 2D WS.sub.2 films from a chloride precursor

Publisher

Springer

Journal title

Journal of materials science, 2022-01, Vol.57 (2), p.1215

Language

English

Formats

Publication information

Publisher

Springer

More information

Scope and Contents

Contents

Monolayer tungsten disulphide (WS.sub.2) is a direct band gap semiconductor which holds promise for a wide range of optoelectronic applications. The large-area growth of WS.sub.2 has previously been successfully achieved using a W(CO).sub.6 precursor, however, this is flammable and a potent source of carbon monoxide (CO) upon decomposition. To addr...

Alternative Titles

Full title

Optimisation of processing conditions during CVD growth of 2D WS.sub.2 films from a chloride precursor

Authors, Artists and Contributors

Identifiers

Primary Identifiers

Record Identifier

TN_cdi_gale_infotracacademiconefile_A689534909

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_gale_infotracacademiconefile_A689534909

Other Identifiers

ISSN

0022-2461

DOI

10.1007/s10853-021-06708-1

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