Chemical vapor deposition improves antiadhesion properties of silicon stamps

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_gale_infotracgeneralonefile_A131958187

Full title

Publisher

Frost & Sullivan

Journal title

Advanced coatings & surface technology, 2005-04, Vol.18 (4), p.11

Language

English

Formats

Publisher

Frost & Sullivan

Subjects and topics

Full title

Chemical vapor deposition improves antiadhesion properties of silicon stamps

Record Identifier

TN_cdi_gale_infotracgeneralonefile_A131958187

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_gale_infotracgeneralonefile_A131958187

ISSN

0896-422X

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