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Features of the selective manganese doping of GaAs structures

Features of the selective manganese doping of GaAs structures

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_osti_scitechconnect_22756262

Features of the selective manganese doping of GaAs structures

About this item

Full title

Features of the selective manganese doping of GaAs structures

Publisher

Moscow: Pleiades Publishing

Journal title

Semiconductors (Woodbury, N.Y.), 2017-11, Vol.51 (11), p.1415-1419

Language

English

Formats

Publication information

Publisher

Moscow: Pleiades Publishing

More information

Scope and Contents

Contents

The effect of technological parameters on the selective manganese doping of arsenide–gallium heterostructures fabricated by a combination of methods of MOS-hydride epitaxy and pulsed-laser deposition is investigated. As these parameters, the impurity content in the manganese δ layer and the structureformation temperature are used. It is established...

Alternative Titles

Full title

Features of the selective manganese doping of GaAs structures

Identifiers

Primary Identifiers

Record Identifier

TN_cdi_osti_scitechconnect_22756262

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_osti_scitechconnect_22756262

Other Identifiers

ISSN

1063-7826

E-ISSN

1090-6479

DOI

10.1134/S1063782617110148

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