Development of element technologies for EUVL
Development of element technologies for EUVL
About this item
Full title
Development of element technologies for EUVL
Author / Creator
Publisher
Berlin: De Gruyter
Journal title
Advanced optical technologies, 2015-08, Vol.4 (4), p.319-331
Language
English
Formats
Publication information
Publisher
Berlin: De Gruyter
Subjects
More information
Scope and Contents
Contents
Thirty years have passed since the first report on extreme ultraviolet lithography (EUVL) was presented at the annual meeting of the Japanese Society of Applied Physics in 1986. This technology is now in the manufacturing development stage. The high-volume manufacturing of dynamic-random-access-memory (DRAM) chips with a line width of 15 nm is expe...
Alternative Titles
Full title
Development of element technologies for EUVL
Authors, Artists and Contributors
Author / Creator
Identifiers
Primary Identifiers
Record Identifier
TN_cdi_proquest_journals_1739126117
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_1739126117
Other Identifiers
ISSN
2192-8576
E-ISSN
2192-8584
DOI
10.1515/aot-2015-0027
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