Preparation of a Non-Polar ZnO Film on a Single-Crystal NdGaO3 Substrate by the RF Sputtering Method
Preparation of a Non-Polar ZnO Film on a Single-Crystal NdGaO3 Substrate by the RF Sputtering Method
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Kashiwaba, Y. , Tanaka, Y. , Sakuma, M. , Abe, T. , Imai, Y. , Kawasaki, K. , Nakagawa, A. , Niikura, I. , Kashiwaba, Y. and Osada, H.
Publisher
New York: Springer US
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Publisher
New York: Springer US
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Contents
Preparation of non-polar ZnO (
11
2
¯
0
) films on single-crystal NdGaO
3
(NGO) (001) substrates was successfully achieved by the radio frequency (RF) sputtering method. Orientation, deposition rate, and surface roughness of ZnO films strongly depend on the working pressure. Characteristics of ZnO films deposited on single-crys...
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Full title
Preparation of a Non-Polar ZnO Film on a Single-Crystal NdGaO3 Substrate by the RF Sputtering Method
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TN_cdi_proquest_journals_2024670317
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https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2024670317
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ISSN
0361-5235
E-ISSN
1543-186X
DOI
10.1007/s11664-018-6283-9
