Microfabrication of large area high-stress silicon nitride membranes for optomechanical devices
Microfabrication of large area high-stress silicon nitride membranes for optomechanical devices
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Author / Creator
Serra, E , Bawaj, M , Borrielli, A , G Di Giuseppe , te, S , Kralj, N , Malossi, N , Marconi, L , Marin, F , Marino, F , Morana, B , Natali, R , Pandraud, G , Pontin, A , Prodi, G A , Rossi, M , Sarro, P M , Vitali, D and Bonaldi, M
Publisher
Ithaca: Cornell University Library, arXiv.org
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English
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Ithaca: Cornell University Library, arXiv.org
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Contents
In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiN\(_x\) membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiN\(_x\) membranes were fabricated and used as optomechanical resonators in a Michelson interferometer and in a F...
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Full title
Microfabrication of large area high-stress silicon nitride membranes for optomechanical devices
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TN_cdi_proquest_journals_2080144304
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2080144304
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E-ISSN
2331-8422
DOI
10.48550/arxiv.1601.02669
