Oxidation Kinetics of Nitrogen Doped TiO2-δ Thin Films: Analysis on the Basis of Oxygen Activity Dep...
Oxidation Kinetics of Nitrogen Doped TiO2-δ Thin Films: Analysis on the Basis of Oxygen Activity Dependence of the Chemical Diffusion Coefficient
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Zurich: Trans Tech Publications Ltd
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English
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Zurich: Trans Tech Publications Ltd
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The model explaining the occurrence of the electron concentration step front during oxidation of nitrogen-doped TiO2-δ thin films is presented. This model is based on ambipolar chemical diffusion coefficient analysis, for which immobile and uniformly distributed nitrogen component is assumed. The diffusion species and oxygen activity (pressure) pro...
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Oxidation Kinetics of Nitrogen Doped TiO2-δ Thin Films: Analysis on the Basis of Oxygen Activity Dependence of the Chemical Diffusion Coefficient
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TN_cdi_proquest_journals_2198629670
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https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2198629670
