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15 kV n-GTOs in 4H-SiC

15 kV n-GTOs in 4H-SiC

15 kV n-GTOs in 4H-SiC

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2260275854

15 kV n-GTOs in 4H-SiC

About this item

Full title

15 kV n-GTOs in 4H-SiC

Publisher

Pfaffikon: Trans Tech Publications

Journal title

Materials science forum, 2019-07, Vol.963, p.1-1

Language

English

Formats

Publication information

Publisher

Pfaffikon: Trans Tech Publications

More information

Scope and Contents

Contents

High performance 15 kV n-GTOs were demonstrated for the first time in 4H-SiC. The device utilized a 140 μm thick, lightly doped n-type drift layer, with 1450°C lifetime enhancement oxidation, which resulted in a carrier lifetime of 17.5 μs. The p+ backside injector layer was thinned to minimize parasitic resistances. A room temperature forward volt...

Alternative Titles

Full title

15 kV n-GTOs in 4H-SiC

Identifiers

Primary Identifiers

Record Identifier

TN_cdi_proquest_journals_2260275854

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2260275854

Other Identifiers

ISBN

9783035713329,3035713324

ISSN

0255-5476,1662-9752

E-ISSN

1662-9752

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