Momentum microscopy of the layered semiconductor TiS2 and Ni intercalated Ni1 3TiS2
Momentum microscopy of the layered semiconductor TiS2 and Ni intercalated Ni1 3TiS2
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Publisher
Bristol: IOP Publishing
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Language
English
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Bristol: IOP Publishing
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Contents
The detailed electronic structure of a layered semiconductor 1T-TiS2 and its modification in Ni-intercalated Ni1 3TiS2 were studied beyond the full surface Brillouin zone by use of a momentum microscope and He-I light source on their in-situ cleaved surfaces. Clear dispersions associated with the electron Fermi surface (FS) pockets induced by the s...
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Full title
Momentum microscopy of the layered semiconductor TiS2 and Ni intercalated Ni1 3TiS2
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TN_cdi_proquest_journals_2312940459
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https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2312940459
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E-ISSN
1367-2630
DOI
10.1088/1367-2630/17/8/083010
