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Improvement of Growth Interface Stability for 4-Inch Silicon Carbide Crystal Growth in TSSG

Improvement of Growth Interface Stability for 4-Inch Silicon Carbide Crystal Growth in TSSG

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2535267114

Improvement of Growth Interface Stability for 4-Inch Silicon Carbide Crystal Growth in TSSG

About this item

Full title

Improvement of Growth Interface Stability for 4-Inch Silicon Carbide Crystal Growth in TSSG

Publisher

Basel: MDPI AG

Journal title

Crystals (Basel), 2019-12, Vol.9 (12), p.653

Language

English

Formats

Publication information

Publisher

Basel: MDPI AG

More information

Scope and Contents

Contents

The growth interface instability of large-size SiC growth in top-seeded solution growth (TSSG) is a bottleneck for industrial production. The authors have previously simulated the growth of 4-inch SiC crystals and found that the interface instability in TSSG was greatly affected by the flow field. According to our simulation of the flow field, we p...

Alternative Titles

Full title

Improvement of Growth Interface Stability for 4-Inch Silicon Carbide Crystal Growth in TSSG

Authors, Artists and Contributors

Identifiers

Primary Identifiers

Record Identifier

TN_cdi_proquest_journals_2535267114

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2535267114

Other Identifiers

ISSN

2073-4352

E-ISSN

2073-4352

DOI

10.3390/cryst9120653

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