RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate
RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate
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Basel: MDPI AG
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Language
English
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Basel: MDPI AG
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Rutile titanium oxide (TiO2) thin films require more energy to crystallize than the anatase phase of TiO2. It is a prime candidate for micro-optoelectronics and is usually obtained either by high substrate temperature, applying a substrate bias, pulsed gas flow to modify the pressure, or ex situ annealing. In the present work, we managed to obtain...
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Full title
RF Magnetron Sputtering Deposition of TiO2 Thin Films in a Small Continuous Oxygen Flow Rate
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TN_cdi_proquest_journals_2548329222
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https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2548329222
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ISSN
2079-6412
E-ISSN
2079-6412
DOI
10.3390/coatings9070442
