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Comparison of III–V Heterostructures Grown on Ge/Si, Ge/SOI, and GaAs

Comparison of III–V Heterostructures Grown on Ge/Si, Ge/SOI, and GaAs

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2677010578

Comparison of III–V Heterostructures Grown on Ge/Si, Ge/SOI, and GaAs

About this item

Full title

Comparison of III–V Heterostructures Grown on Ge/Si, Ge/SOI, and GaAs

Publisher

Moscow: Pleiades Publishing

Journal title

Semiconductors (Woodbury, N.Y.), 2022-02, Vol.56 (2), p.122-133

Language

English

Formats

Publication information

Publisher

Moscow: Pleiades Publishing

More information

Scope and Contents

Contents

III–V/Ge/Si(001), III–V/Ge/SOI(001), and III–V/GaAs(001) heterostructures are fabricated and investigated. The Ge buffer layer for the III–V/Ge/Si structure is grown by vapor deposition onto a Si(001) substrate via the decomposition of monogermane on a “hot wire”. In the case of III–V/Ge/SOI, the Ge buffer layer is obtained on a SOI(001) substrate...

Alternative Titles

Full title

Comparison of III–V Heterostructures Grown on Ge/Si, Ge/SOI, and GaAs

Identifiers

Primary Identifiers

Record Identifier

TN_cdi_proquest_journals_2677010578

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2677010578

Other Identifiers

ISSN

1063-7826

E-ISSN

1090-6479

DOI

10.1134/S1063782622010171

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