Modeling of the sputtering process of cubic silver halide microcrystals and its relevance in depth p...
Modeling of the sputtering process of cubic silver halide microcrystals and its relevance in depth profiling by secondary-ion mass spectrometry (SIMS)
About this item
Full title
Author / Creator
Publisher
Berlin: Springer Nature B.V
Journal title
Language
English
Formats
Publication information
Publisher
Berlin: Springer Nature B.V
Subjects
More information
Scope and Contents
Contents
Secondary-ion mass spectrometry is frequently used for concentration–depth profiling of macroscopic samples, but it is certainly not a common analytical technique for the analysis of sub-micrometer-size particles. This is because of the additional ion-bombardment-induced artifacts which can occur when a three-dimensional microvolume is sputtered, i...
Alternative Titles
Full title
Modeling of the sputtering process of cubic silver halide microcrystals and its relevance in depth profiling by secondary-ion mass spectrometry (SIMS)
Authors, Artists and Contributors
Identifiers
Primary Identifiers
Record Identifier
TN_cdi_proquest_journals_2705542915
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2705542915
Other Identifiers
ISSN
1618-2642
E-ISSN
1618-2650
DOI
10.1007/s002160100880