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Characterization of niobium carbide film deposited on commercially pure titanium by low-temperature...

Characterization of niobium carbide film deposited on commercially pure titanium by low-temperature...

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2919348281

Characterization of niobium carbide film deposited on commercially pure titanium by low-temperature plasma glow discharge

About this item

Full title

Characterization of niobium carbide film deposited on commercially pure titanium by low-temperature plasma glow discharge

Publisher

Bangalore: Indian Academy of Sciences

Journal title

Bulletin of materials science, 2023-06, Vol.46 (3), p.135, Article 135

Language

English

Formats

Publication information

Publisher

Bangalore: Indian Academy of Sciences

More information

Scope and Contents

Contents

By using a low-temperature plasma glow discharge with argon gas and C
2
H
2
as a carbon source, niobium carbide thin films were applied on a commercially pure titanium substrate. The coatings were deposited in three different deposition times: Group-1 with 2-h deposition time, group-2 with 4-h deposition time and group-3 with 6-h deposi...

Alternative Titles

Full title

Characterization of niobium carbide film deposited on commercially pure titanium by low-temperature plasma glow discharge

Authors, Artists and Contributors

Identifiers

Primary Identifiers

Record Identifier

TN_cdi_proquest_journals_2919348281

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2919348281

Other Identifiers

ISSN

0973-7669,0250-4707

E-ISSN

0973-7669

DOI

10.1007/s12034-023-02966-8

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