Fabrication, Boron Leaching, and Electrochemical Impedance Spectroscopy of Nanoporous P-Type Silicon
Fabrication, Boron Leaching, and Electrochemical Impedance Spectroscopy of Nanoporous P-Type Silicon
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Publisher
Dordrecht: Springer Netherlands
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Language
English
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Dordrecht: Springer Netherlands
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Contents
Nanoporous silicon (NPS) with mesopores size (2–50 nm) formed by anodization of highly doped p-type silicon at specific anodizing conditions is highly needed for technological applications. However, the surface of the NPS was rapidly oxidized upon exposure to the atmosphere due to the presence of boron. Therefore, there is a need for the leaching o...
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Full title
Fabrication, Boron Leaching, and Electrochemical Impedance Spectroscopy of Nanoporous P-Type Silicon
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TN_cdi_proquest_journals_2920198691
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2920198691
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ISSN
1876-990X
E-ISSN
1876-9918
DOI
10.1007/s12633-021-01338-3
