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MOCVD Growth of InGaAs Metamorphic Heterostructures for Photodiodes with Low Dark Current

MOCVD Growth of InGaAs Metamorphic Heterostructures for Photodiodes with Low Dark Current

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_3106442377

MOCVD Growth of InGaAs Metamorphic Heterostructures for Photodiodes with Low Dark Current

About this item

Full title

MOCVD Growth of InGaAs Metamorphic Heterostructures for Photodiodes with Low Dark Current

Publisher

Moscow: Pleiades Publishing

Journal title

Semiconductors (Woodbury, N.Y.), 2024-05, Vol.58 (5), p.451-456

Language

English

Formats

Publication information

Publisher

Moscow: Pleiades Publishing

More information

Scope and Contents

Contents

The epitaxial growth technique of InGaAs photodiode structures based on a digital InGaAs/GaAs metamorphic buffer layer by metalorganic chemical vapor deposition has been developed. The spectral dependence of the photocurrent of photodiodes based on the produced structures has a maximum at the 1.24 μm wavelength. The photosensitivity range at 10% of...

Alternative Titles

Full title

MOCVD Growth of InGaAs Metamorphic Heterostructures for Photodiodes with Low Dark Current

Identifiers

Primary Identifiers

Record Identifier

TN_cdi_proquest_journals_3106442377

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_3106442377

Other Identifiers

ISSN

1063-7826

E-ISSN

1090-6479

DOI

10.1134/S1063782624050130

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