Growth and photosensitivity of p Si- n (GaSb)(1 - x)(Si(2)) (x) structures
Growth and photosensitivity of p Si- n (GaSb)(1 - x)(Si(2)) (x) structures
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English
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The possibility of growing a continuous solid solution of (GaSb)(1 - x) (Si(2)) (x) (x = 0-0.99) on single-crystalline silicon substrates by liquid-phase epitaxy from a tin solution melt is considered. The structural, volt-ampere, and spectral characteristics of the pSi-n(GaSb)(1 - x) (Si(2)) (x) structures are investigated.
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Growth and photosensitivity of p Si- n (GaSb)(1 - x)(Si(2)) (x) structures
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TN_cdi_proquest_miscellaneous_743686871
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https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_miscellaneous_743686871
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0003-701X
DOI
10.3103/S0003701X07030140