US Patent Issued to National Chung-Shan Institute of Science and Technology on Dec. 29 for "Anode ma...
US Patent Issued to National Chung-Shan Institute of Science and Technology on Dec. 29 for "Anode material of nano-silicon having multilayer-graphene as carrier and coated with silicon suboxide and with amorphous carbon layer and method for fabricating the same" (Taiwanese Inventors)
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Full title
US Patent Issued to National Chung-Shan Institute of Science and Technology on Dec. 29 for "Anode material of nano-silicon having multilayer-graphene as carrier and coated with silicon suboxide and with amorphous carbon layer and method for fabricating the same" (Taiwanese Inventors)
Publisher
Washington, D.C: HT Digital Streams Limited
Journal title
US Fed News Service, Including US State News, 2021
Language
English
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Publisher
Washington, D.C: HT Digital Streams Limited
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Full title
US Patent Issued to National Chung-Shan Institute of Science and Technology on Dec. 29 for "Anode material of nano-silicon having multilayer-graphene as carrier and coated with silicon suboxide and with amorphous carbon layer and method for fabricating the same" (Taiwanese Inventors)
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TN_cdi_proquest_wirefeeds_2475010361
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https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_wirefeeds_2475010361
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