Orthogonal Experimental Optimization of Preparation and Microstructural Properties of a Diffusion Ba...
Orthogonal Experimental Optimization of Preparation and Microstructural Properties of a Diffusion Barrier for Tantalum-Based Silicide Coatings
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Publisher
Switzerland: MDPI AG
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Language
English
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Publisher
Switzerland: MDPI AG
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Scope and Contents
Contents
To solve the problem of silicide coatings on tantalum substrates failing due to elemental diffusion under high-temperature oxidation environments and to find diffusion barrier materials with excellent effects of impeding Si elemental spreading, TaB
and TaC coatings were prepared on tantalum substrates by the encapsulation and infiltration method...
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Full title
Orthogonal Experimental Optimization of Preparation and Microstructural Properties of a Diffusion Barrier for Tantalum-Based Silicide Coatings
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Record Identifier
TN_cdi_pubmedcentral_primary_oai_pubmedcentral_nih_gov_10254208
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_pubmedcentral_primary_oai_pubmedcentral_nih_gov_10254208
Other Identifiers
ISSN
1996-1944
E-ISSN
1996-1944
DOI
10.3390/ma16114097