Dependence of track etching kinetics on chemical reactivity around the ion path
Dependence of track etching kinetics on chemical reactivity around the ion path
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Publisher
London: Nature Publishing Group UK
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Language
English
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Publisher
London: Nature Publishing Group UK
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Scope and Contents
Contents
Etching kinetics of swift heavy ions (SHI) tracks in olivine is investigated in frame of experimentally verified numerical approach. The model takes into account variation of induced chemical reactivity of the material around the whole ion trajectory with the nanometric accuracy. This enables a quantitative description of wet chemical etching of SH...
Alternative Titles
Full title
Dependence of track etching kinetics on chemical reactivity around the ion path
Authors, Artists and Contributors
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TN_cdi_pubmedcentral_primary_oai_pubmedcentral_nih_gov_6814710
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_pubmedcentral_primary_oai_pubmedcentral_nih_gov_6814710
Other Identifiers
ISSN
2045-2322
E-ISSN
2045-2322
DOI
10.1038/s41598-019-51748-y
