Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.
Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.
Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.
About this item
Full title
Author / Creator
Publisher
New York : J. Wiley, 1993.
Date
1993.
Call Numbers
N621.381531/12
Record Identifier
MMS ID
Language
English
Formats
Physical Description
Physical content
xii, 183 p. : ill. (some col.) ; 25 cm.
Contents
I. Submicron Patterning: State of the Art and Vistas. 1. The Amelioration. 2. Prospective Avenues -- II. Electron Beam Lithography. 2. Electron Beam Sources. 3. Resists. 4. Technology. 5. EBL Applications -- 6. Conclusions and Trajections -- III. Ion Beam Lithography. 2. I-Beam Resists. 3. Exposure...
Publication information
Publisher
New York : J. Wiley, 1993.
Place of Publication
New York (State)
Date Published
1993.
Subjects
More information
Alternative Titles
Full title
Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.
Notes
General note
Includes bibliographical references and index.
Contextual Information
Related resource (online)
Identifiers
Primary Identifiers
Call Numbers
N621.381531/12
Record Identifier
74VKOG63vDWy
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/74VKOG63vDWy
Other Identifiers
ISBN
8122405614 (Wiley Eastern)
9780470220634 (J. Wiley)
0470220635 (J. Wiley)
9788122405613 (Wiley Eastern)
DDC
621.381531
MMS ID
991022554779702626
