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Low thermal budget high-k/metal surface gate for buried donor-based devices

Low thermal budget high-k/metal surface gate for buried donor-based devices

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_crossref_primary_10_1088_2515_7639_ab953b

Low thermal budget high-k/metal surface gate for buried donor-based devices

About this item

Full title

Low thermal budget high-k/metal surface gate for buried donor-based devices

Publisher

Bristol: IOP Publishing

Journal title

JPhys materials, 2020-07, Vol.3 (3), p.35002

Language

English

Formats

Publication information

Publisher

Bristol: IOP Publishing

More information

Scope and Contents

Contents

Atomic precision advanced manufacturing (APAM) offers creation of donor devices in an atomically thin layer doped beyond the solid solubility limit, enabling unique device physics. This presents an opportunity to use APAM as a pathfinding platform to investigate digital electronics at the atomic limit. Scaling to smaller transistors is increasingly...

Alternative Titles

Full title

Low thermal budget high-k/metal surface gate for buried donor-based devices

Identifiers

Primary Identifiers

Record Identifier

TN_cdi_crossref_primary_10_1088_2515_7639_ab953b

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_crossref_primary_10_1088_2515_7639_ab953b

Other Identifiers

ISSN

2515-7639

E-ISSN

2515-7639

DOI

10.1088/2515-7639/ab953b

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