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Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography

Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_02a6a6aed69f43d89f71e4470e55cdc2

Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography

About this item

Full title

Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography

Publisher

London: Nature Publishing Group UK

Journal title

Nature communications, 2024-04, Vol.15 (1), p.2920-2920, Article 2920

Language

English

Formats

Publication information

Publisher

London: Nature Publishing Group UK

More information

Scope and Contents

Contents

Metal-organic frameworks (MOFs) with diverse chemistry, structures, and properties have emerged as appealing materials for miniaturized solid-state devices. The incorporation of MOF films in these devices, such as the integrated microelectronics and nanophotonics, requires robust patterning methods. However, existing MOF patterning methods suffer f...

Alternative Titles

Full title

Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography

Identifiers

Primary Identifiers

Record Identifier

TN_cdi_doaj_primary_oai_doaj_org_article_02a6a6aed69f43d89f71e4470e55cdc2

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_02a6a6aed69f43d89f71e4470e55cdc2

Other Identifiers

ISSN

2041-1723

E-ISSN

2041-1723

DOI

10.1038/s41467-024-47293-6

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