Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography
Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography
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Tian, Xiaoli , Li, Fu , Tang, Zhenyuan , Wang, Song , Weng, Kangkang , Liu, Dan , Lu, Shaoyong , Liu, Wangyu , Fu, Zhong , Li, Wenjun , Qiu, Hengwei , Tu, Min , Zhang, Hao and Li, Jinghong
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London: Nature Publishing Group UK
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English
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London: Nature Publishing Group UK
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Contents
Metal-organic frameworks (MOFs) with diverse chemistry, structures, and properties have emerged as appealing materials for miniaturized solid-state devices. The incorporation of MOF films in these devices, such as the integrated microelectronics and nanophotonics, requires robust patterning methods. However, existing MOF patterning methods suffer f...
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Full title
Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography
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TN_cdi_doaj_primary_oai_doaj_org_article_02a6a6aed69f43d89f71e4470e55cdc2
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https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_02a6a6aed69f43d89f71e4470e55cdc2
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ISSN
2041-1723
E-ISSN
2041-1723
DOI
10.1038/s41467-024-47293-6