Near-field infrared nanoscopic study of EUV- and e-beam-exposed hydrogen silsesquioxane photoresist
Near-field infrared nanoscopic study of EUV- and e-beam-exposed hydrogen silsesquioxane photoresist
About this item
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Author / Creator
Kim, Jiho , Lee, Jin-Kyun , Chae, Boknam , Ahn, Jinho and Lee, Sangsul
Publisher
Singapore: Springer Nature Singapore
Journal title
Language
English
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Publisher
Singapore: Springer Nature Singapore
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Scope and Contents
Contents
This article presents a technique of scattering-type scanning near-field optical microscopy (s-SNOM) based on scanning probe microscopy as a nanoscale-resolution chemical visualization technique of the structural changes in photoresist thin films. Chemical investigations were conducted in the nanometer regime by highly concentrated near-field infra...
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Full title
Near-field infrared nanoscopic study of EUV- and e-beam-exposed hydrogen silsesquioxane photoresist
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Author / Creator
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Record Identifier
TN_cdi_doaj_primary_oai_doaj_org_article_1eaa32e2edfb4e94872750a71e7f1a6a
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_1eaa32e2edfb4e94872750a71e7f1a6a
Other Identifiers
ISSN
2196-5404
E-ISSN
2196-5404
DOI
10.1186/s40580-022-00345-3
