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Retention Model of TaO/HfO x and TaO/AlO x RRAM with Self-Rectifying Switch Characteristics

Retention Model of TaO/HfO x and TaO/AlO x RRAM with Self-Rectifying Switch Characteristics

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_3d97a3c18f384278bd773d0cc0904cb6

Retention Model of TaO/HfO x and TaO/AlO x RRAM with Self-Rectifying Switch Characteristics

About this item

Full title

Retention Model of TaO/HfO x and TaO/AlO x RRAM with Self-Rectifying Switch Characteristics

Publisher

United States: SpringerOpen

Journal title

Nanoscale research letters, 2017-12, Vol.12 (1), p.407-407, Article 407

Language

English

Formats

Publication information

Publisher

United States: SpringerOpen

More information

Scope and Contents

Contents

A retention behavior model for self-rectifying TaO/HfO
- and TaO/AlO
-based resistive random-access memory (RRAM) is proposed. Trapping-type RRAM can have a high resistance state (HRS) and a low resistance state (LRS); the degradation in a LRS is usually more severe than that in a HRS, because the LRS during the SET process is limited by the...

Alternative Titles

Full title

Retention Model of TaO/HfO x and TaO/AlO x RRAM with Self-Rectifying Switch Characteristics

Identifiers

Primary Identifiers

Record Identifier

TN_cdi_doaj_primary_oai_doaj_org_article_3d97a3c18f384278bd773d0cc0904cb6

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_3d97a3c18f384278bd773d0cc0904cb6

Other Identifiers

ISSN

1931-7573

E-ISSN

1556-276X

DOI

10.1186/s11671-017-2179-5

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