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High-Efficient Spin Injection in GaN at Room Temperature Through A Van der Waals Tunnelling Barrier

High-Efficient Spin Injection in GaN at Room Temperature Through A Van der Waals Tunnelling Barrier

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_fd43fdc27ae84eb89fd164b1592d94d3

High-Efficient Spin Injection in GaN at Room Temperature Through A Van der Waals Tunnelling Barrier

About this item

Full title

High-Efficient Spin Injection in GaN at Room Temperature Through A Van der Waals Tunnelling Barrier

Publisher

New York: Springer US

Journal title

Nanoscale research letters, 2022-08, Vol.17 (1), p.74-74, Article 74

Language

English

Formats

Publication information

Publisher

New York: Springer US

More information

Scope and Contents

Contents

Achieving high-efficient spin injection in semiconductors is critical for developing spintronic devices. Although a tunnel spin injector is typically used, the construction of a high-quality tunnel barrier remains a significant challenge due to the large lattice mismatch between oxides and semiconductors. In this work, van der Waals h-BN films with...

Alternative Titles

Full title

High-Efficient Spin Injection in GaN at Room Temperature Through A Van der Waals Tunnelling Barrier

Identifiers

Primary Identifiers

Record Identifier

TN_cdi_doaj_primary_oai_doaj_org_article_fd43fdc27ae84eb89fd164b1592d94d3

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_doaj_primary_oai_doaj_org_article_fd43fdc27ae84eb89fd164b1592d94d3

Other Identifiers

ISSN

1556-276X,1931-7573

E-ISSN

1556-276X

DOI

10.1186/s11671-022-03712-5

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