At wavelength coherent scatterometry microscope using high-order harmonics for EUV mask inspection
At wavelength coherent scatterometry microscope using high-order harmonics for EUV mask inspection
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Publisher
Bristol: IOP Publishing
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English
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Bristol: IOP Publishing
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In this review, we describe our research on the development of the 13.5 nm coherent microscope using high-order harmonics for the mask inspection of extreme ultraviolet (EUV) lithography. EUV lithography is a game-changing piece of technology for high-volume manufacturing of commercial semiconductors. Many top manufacturers apply EUV technology for...
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Full title
At wavelength coherent scatterometry microscope using high-order harmonics for EUV mask inspection
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TN_cdi_iop_journals_10_1088_2631_7990_ab3b4e
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_iop_journals_10_1088_2631_7990_ab3b4e
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ISSN
2631-8644
E-ISSN
2631-7990
DOI
10.1088/2631-7990/ab3b4e
