Watermark Formation on Bare Silicon: Impact of Illumination and Substrate Doping
Watermark Formation on Bare Silicon: Impact of Illumination and Substrate Doping
About this item
Full title
Watermark Formation on Bare Silicon: Impact of Illumination and Substrate Doping
Author / Creator
Publisher
Zurich: Trans Tech Publications Ltd
Journal title
Solid state phenomena, 2014-09, Vol.219, p.89-92
Language
English
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Publication information
Publisher
Zurich: Trans Tech Publications Ltd
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Scope and Contents
Contents
The wet cleaning process plays an important role in advanced semiconductor industry. Particularly when bare silicon areas are exposed, wafer drying can result in undesired watermark (WM) residues on the surface [1-2]. In principle there are three components effecting the formation, shape and size of WM. 1) composition of the ambient like oxygen con...
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Full title
Watermark Formation on Bare Silicon: Impact of Illumination and Substrate Doping
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Record Identifier
TN_cdi_proquest_journals_1791380434
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_1791380434
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