Interface Engineering Enabled Low Temperature Growth of Magnetic Insulator on Topological Insulator
Interface Engineering Enabled Low Temperature Growth of Magnetic Insulator on Topological Insulator
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Ithaca: Cornell University Library, arXiv.org
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English
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Ithaca: Cornell University Library, arXiv.org
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Combining topological insulators (TIs) and magnetic materials in heterostructures is crucial for advancing spin-based electronics. Magnetic insulators (MIs) can be deposited on TIs using the spin-spray process, which is a unique non-vacuum, low-temperature growth process. TIs have highly reactive surfaces that oxidize upon exposure to atmosphere, m...
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Interface Engineering Enabled Low Temperature Growth of Magnetic Insulator on Topological Insulator
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TN_cdi_proquest_journals_2697201997
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https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2697201997
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E-ISSN
2331-8422
DOI
10.48550/arxiv.2208.00499
