Phase mask pinholes as spatial filters for laser interference lithography
Phase mask pinholes as spatial filters for laser interference lithography
About this item
Full title
Author / Creator
Publisher
Ithaca: Cornell University Library, arXiv.org
Journal title
Language
English
Formats
Publication information
Publisher
Ithaca: Cornell University Library, arXiv.org
Subjects
More information
Scope and Contents
Contents
Laser resonators have outputs with Gaussian spatial beam profiles. In laser interference lithography (LIL), using such Gaussian shaped beams leads to an inhomogeneous exposure of the substrate. As a result, dimensions of lithography defined features vary significantly across the substrate. In most LIL setups, pinholes are used as filters to remove...
Alternative Titles
Full title
Phase mask pinholes as spatial filters for laser interference lithography
Authors, Artists and Contributors
Author / Creator
Identifiers
Primary Identifiers
Record Identifier
TN_cdi_proquest_journals_2738301732
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2738301732
Other Identifiers
E-ISSN
2331-8422
DOI
10.48550/arxiv.2211.09985
