Non-alkyl tin-oxo clusters as new-type patterning materials for nanolithography
Non-alkyl tin-oxo clusters as new-type patterning materials for nanolithography
About this item
Full title
Author / Creator
Wang, Di , Yi, Xiaofeng and Zhang, Lei
Publisher
Beijing: Science China Press
Journal title
Language
English
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Publication information
Publisher
Beijing: Science China Press
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More information
Scope and Contents
Contents
Nanolithography plays crucial roles in the miniaturization of dense integrated circuit, which extremely depends on innovative resist materials. Recently, metal-containing resists have been explored due to their higher short-wavelength photon absorption than traditional polymer resists. Herein, for the first time, the patterning performance of non-a...
Alternative Titles
Full title
Non-alkyl tin-oxo clusters as new-type patterning materials for nanolithography
Authors, Artists and Contributors
Author / Creator
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Record Identifier
TN_cdi_proquest_journals_2918608043
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2918608043
Other Identifiers
ISSN
1674-7291
E-ISSN
1869-1870
DOI
10.1007/s11426-021-1092-2
