Log in to save to my catalogue

Effect of Etching Duration on the Morphological and Opto-Electrical Properties of Silicon Nanowires...

Effect of Etching Duration on the Morphological and Opto-Electrical Properties of Silicon Nanowires...

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2919516309

Effect of Etching Duration on the Morphological and Opto-Electrical Properties of Silicon Nanowires Obtained by Ag-Assisted Chemical Etching

About this item

Full title

Effect of Etching Duration on the Morphological and Opto-Electrical Properties of Silicon Nanowires Obtained by Ag-Assisted Chemical Etching

Publisher

Dordrecht: Springer Netherlands

Journal title

SILICON, 2021-01, Vol.13 (1), p.179-187

Language

English

Formats

Publication information

Publisher

Dordrecht: Springer Netherlands

More information

Scope and Contents

Contents

Silicon nanowires (SiNWs) were obtained on p-Si (100) substrate by Ag-assisted chemical etching method in two-step process. The influence of the etching duration on the morphological, optical and electrical properties of SiNWs samples was investigated. SEM images show clearly the presence of nanowires and the existence of porous silicon structure e...

Alternative Titles

Full title

Effect of Etching Duration on the Morphological and Opto-Electrical Properties of Silicon Nanowires Obtained by Ag-Assisted Chemical Etching

Authors, Artists and Contributors

Identifiers

Primary Identifiers

Record Identifier

TN_cdi_proquest_journals_2919516309

Permalink

https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_2919516309

Other Identifiers

ISSN

1876-990X

E-ISSN

1876-9918

DOI

10.1007/s12633-020-00416-2

How to access this item