Selecting Alternative Metals for Advanced Interconnects
Selecting Alternative Metals for Advanced Interconnects
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Author / Creator
Jean-Philippe Soulié , Sankaran, Kiroubanand , Benoit Van Troeye , Leśniewska, Alicja , Olalla Varela Pedreira , Oprins, Herman , Delie, Gilles , Fleischmann, Claudia , Boakes, Lizzie , Rolin, Cédric , Ragnarsson, Lars-Åke , Croes, Kristof , Park, Seongho , Swerts, Johan , Pourtois, Geoffrey , Tőkei, Zsolt and Adelmann, Christoph
Publisher
Ithaca: Cornell University Library, arXiv.org
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English
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Ithaca: Cornell University Library, arXiv.org
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Contents
Interconnect resistance and reliability have emerged as critical factors limiting the performance of advanced CMOS circuits. With the slowdown of transistor scaling, interconnect scaling has become the primary driver of continued circuit miniaturization. The associated scaling challenges for interconnects are expected to further intensify in future...
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Full title
Selecting Alternative Metals for Advanced Interconnects
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Record Identifier
TN_cdi_proquest_journals_3068236217
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https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_journals_3068236217
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E-ISSN
2331-8422
