Nanoscale Three-Dimensional Patterning of Molecular Resists by Scanning Probes
Nanoscale Three-Dimensional Patterning of Molecular Resists by Scanning Probes
About this item
Full title
Author / Creator
Publisher
Washington, DC: American Association for the Advancement of Science
Journal title
Language
English
Formats
Publication information
Publisher
Washington, DC: American Association for the Advancement of Science
Subjects
More information
Scope and Contents
Contents
For patterning organic resists, optical and electron beam lithography are the most established methods; however, at resolutions below 30 nanometers, inherent problems result from unwanted exposure of the resist in nearby areas. We present a scanning probe lithography method based on the local desorption of a glassy organic resist by a heatable prob...
Alternative Titles
Full title
Nanoscale Three-Dimensional Patterning of Molecular Resists by Scanning Probes
Authors, Artists and Contributors
Identifiers
Primary Identifiers
Record Identifier
TN_cdi_proquest_miscellaneous_753762366
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_miscellaneous_753762366
Other Identifiers
ISSN
0036-8075
E-ISSN
1095-9203
DOI
10.1126/science.1187851
