International Business Machines Corporation; Patent Application Titled "Photo-Patternable Dielectric...
International Business Machines Corporation; Patent Application Titled "Photo-Patternable Dielectric Materials Curable to Porous Dielectric Materials, Formulations, Precursors and Methods of Use Thereof" Published Online
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Atlanta: NewsRx
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English
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Atlanta: NewsRx
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According to news reporting originating from Washington, D.C., by VerticalNews journalists, a patent application by the inventors Brock, Phillip J. (Sunnyvale, CA); Lin, Qinghuang (Yorktown Heights, NY); Miller, Robert D. (San Jose, CA); Nelson, Alshakim (Fremont, CA); Rathore, Jitendra S. (Campbell, CA); Sooriyakumaran, Ratnam (San Jose, CA), file...
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Full title
International Business Machines Corporation; Patent Application Titled "Photo-Patternable Dielectric Materials Curable to Porous Dielectric Materials, Formulations, Precursors and Methods of Use Thereof" Published Online
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TN_cdi_proquest_wirefeeds_1428332042
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https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_proquest_wirefeeds_1428332042
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ISSN
1944-1517
