Comparing XPS and ToF-ERDA measurement of high-k dielectric materials
Comparing XPS and ToF-ERDA measurement of high-k dielectric materials
About this item
Full title
Author / Creator
Martin, D M , Enlund, J , Kappertz, O and Jensen, J
Publisher
Bristol: IOP Publishing
Journal title
Language
English
Formats
Publication information
Publisher
Bristol: IOP Publishing
Subjects
More information
Scope and Contents
Contents
Compositional analysis of aluminium oxy-nitride (AlON) films deposited by reactive magnetron sputtering was performed using time-of-flight elastic recoil detection analysis (ToF-ERDA) and X-ray photoelectron spectroscopy (XPS) with sputter profiling. The composition profiles of the films depend on deposition conditions. The benefits of the differen...
Alternative Titles
Full title
Comparing XPS and ToF-ERDA measurement of high-k dielectric materials
Authors, Artists and Contributors
Author / Creator
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Primary Identifiers
Record Identifier
TN_cdi_swepub_primary_oai_DiVA_org_uu_111106
Permalink
https://devfeature-collection.sl.nsw.gov.au/record/TN_cdi_swepub_primary_oai_DiVA_org_uu_111106
Other Identifiers
ISSN
1742-6596,1742-6588
E-ISSN
1742-6596
DOI
10.1088/1742-6596/100/1/012036
